Electricity: measuring and testing – Fault detecting in electric circuits and of electric components – For fault location
Patent
1997-02-11
2000-04-04
Ballato, Josie
Electricity: measuring and testing
Fault detecting in electric circuits and of electric components
For fault location
324 7629, 324646, 324619, 343735, G01N 2762
Patent
active
060465948
ABSTRACT:
A method and apparatus for measuring electrical characteristics (e.g. current, voltage, phase, etc.) between a power source and a load at a set of harmonic frequencies to determine information about the load (e.g., load impedance, power dissipation, etc). According to one aspect of the invention, a first circuit detects a set of electrical characteristics (e.g., current, voltage, and/or phase) of a signal between the power source and the load. A second circuit, coupled to the first circuit to receive the set of electrical characteristics, provides data representing the set of electrical characteristics at a harmonic frequency associated with the signal. A third circuit, coupled to the second circuit, receives the data and determines information about the load (e.g., impedance, power dissipation, discharge current, etc.) at the harmonic frequency. The information could be used in any number of ways, such as controlling an impedance matching network that may be used in conjunction with the power source and the load, identifying/monitoring a load condition(s), etc.
REFERENCES:
patent: 5343404 (1994-08-01), Girgis
patent: 5691642 (1997-11-01), Dobkin
patent: 5861752 (1999-01-01), Klick
Advanced Energy Industries, Inc.,"13.56-MHZ RFz 60 Plasma Impedance Probe", 8 pages No date.
Advanced Energy Industries, Inc., "An Intelligent Solution to RF Load-Power Variability", vol. 2, No. 3, 3rd Quarter, 1995, 8 pages.
Michael Klick, "Nonlinearity of the radio-Frequency Sheath", J. Appl. Phys. 79 (7), Apr. 1, 1996, 6 pages.
University of Minnesota, "12th International Symposium on Plasma Chemistry Proceedings vol. 1", Aug. 1995, 5 pages.
Adolf-Slaby-Institut, "European Semiconductor", 4 pages No date.
Adolf-Slaby-Institut, "Plasma Monitoring by Hercules", 8 pages No date.
Fourth State Technology, Inc., "Chamber Matching with the RFMS: A Case Study", 17 pages No date.
Fourth State Technology, Inc., "The How-To's of RF Metrology", 9 pages No date.
Fourth State Technology, Inc., "RF Metrology Baseline Study-LRC 4500", 9 pages No date.
Fourth State Technology, Inc., "Enhancing Equipment Performance: Applied Materials 5000 PECVD", 10 pages No date.
Fourth State Technology, Inc., "Enhancing Equipment Performance: Novellus Concept One", 8 pages No date.
Fourth State Technology, Inc., "Enhanced Process Control for the LRC 4720", 5 pages No date.
Advanced Energy Voorhees, Inc.
Ballato Josie
Solis Jose M.
LandOfFree
Method and apparatus for monitoring parameters of an RF powered does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for monitoring parameters of an RF powered , we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for monitoring parameters of an RF powered will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-368956