Photomasking

Details Photomasking Photomasking

2006-08-01

2006-08-01

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C430S030000, C716S030000

Reexamination Certificate

active

07083881

ABSTRACT:
An attenuated phase-shifting photomask (APSM) provides adjustment of attenuation from mask to mask. The APSM includes a multilayer substrate, a buffer thin film coupled to the substrate, and a top layer thin film on top of the buffer thin film. The thin films are etched with a circuit pattern to form a photomask, and are chosen to have certain thicknesses which would provide adjustment of attenuation within a specified attenuation operating range and appropriate phase shift without changing said buffer thin film and said top layer thin film.

REFERENCES:
patent: 5691090 (1997-11-01), Isao et al.
patent: 5939225 (1999-08-01), Dove et al.
patent: 5939227 (1999-08-01), Smith
patent: 5945237 (1999-08-01), Tanabe
patent: 5958629 (1999-09-01), Yan et al.
patent: 6037083 (2000-03-01), Mitsui
patent: 6562522 (2003-05-01), Yan

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