Gas discharge panel and its production method

Details Gas discharge panel and its production method Gas discharge panel and its production method

2006-06-13

2006-06-13

Glick, Edward J. (Department: 2882)

Electric lamp and discharge devices

With gas or vapor

Three or more electrode discharge device

C313S489000

Reexamination Certificate

active

07061181

ABSTRACT:
A gas discharge panel having a plasma display panel includes a pair of substrates facing each other for forming a discharge space; an electrode formed on at least one the substrate; and a dielectric layer for covering the electrode; wherein the dielectric layer contains SiO2as a main component and is composed of a material containing hydrogen of 5×1021atom/cm3or less.

REFERENCES:
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patent: 2000-21304 (2000-01-01), None
patent: 2001-155647 (2001-06-01), None
Idris, et al., “Film Characteristics of Low-Temperature Plasma-Enhanced Chemical Vapor Deposition Silicon Dioxide Using Tetraisocyanatesilane and Oxygen”, Japanese Journal of Applied Physics, Publication Office of Applied Physics, vol. 37, No. 12A, Part 1, Dec. 1998, pp. 6562-6568.
Patent Abstracts of Japan, vol. 18, No. 490, Sep. 13, 1994, for Japanese Publication No. 06 158327, published Jun. 7, 1994.

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