Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Specified wide band gap semiconductor material other than... – Diamond or silicon carbide

Reexamination Certificate

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C257S183000, C257S187000, C257S192000

Reexamination Certificate

active

07151280

ABSTRACT:
A semiconductor device includes a heterojunction semiconductor region9,which forms a heterojunction with a drain region2.The heterojunction semiconductor region9is connected to a source electrode7,and has a band gap different from a band gap of a semiconductor substrate constituting the drain region2.It is possible to set the size of an energy barrier against conduction electrons, which is formed between the drain region2and the heterojunction semiconductor region9,into a desired size by changing the conductivity type or the impurity density of the heterojunction semiconductor region9.This is a characteristic not found in a Schottky junction, in which the size of the energy barrier is inherently determined by a work function of a metal material. It is easy to achieve optimal design of a passive element in response to a withstand voltage system of a MOSFET as a switching element. It is also possible to suppress diffusion potential in a reverse conduction mode and to improve a degree of integration per unit area. As a result, it is possible to reduce the size of elements and to simplify manufacturing processes thereof.

REFERENCES:
patent: 5900648 (1999-05-01), Harris et al.
patent: 2004/0079989 (2004-04-01), Kaneko et al.
patent: 2005/0045892 (2005-03-01), Hayashi et al.
patent: 2005/0062048 (2005-03-01), Hayashi et al.
patent: 2002-299625 (2002-10-01), None

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