Process for producing monomer

Chemistry: molecular biology and microbiology – Micro-organism – tissue cell culture or enzyme using process... – Preparing heterocyclic carbon compound having only o – n – s,...

Reexamination Certificate

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C435S124000, C435S125000, C435S127000

Reexamination Certificate

active

07125692

ABSTRACT:
A process for producing a monomer for resists represented by the following general formula 1:wherein R1represents hydrogen or an optionally substituted alkyl group; R2, R3and R4each independently represent hydrogen or a substituent; and X, Y and Z each independently represent a direct bond or an optionally substituted alkylene group with 1 to 3 chain members,the process comprising carrying out esterification or transesterification in the presence of a biocatalyst.

REFERENCES:
patent: 0 439 779 (1991-08-01), None
patent: 514694 (1992-11-01), None
patent: 4-279576 (1992-10-01), None
patent: 5-219970 (1993-08-01), None
patent: 10-212283 (1998-08-01), None
patent: 2001-235867 (2001-08-01), None
patent: 2001-247513 (2001-09-01), None
Koji Nozaki, et al., “A new single-layer resist for 193-nm lithography”, Jpn, J. Appl. Phys., vol. 35, No. 4B, pp.: L528-530 Apr. 15, 1996.

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