Method of manufacturing combination type thin film magnetic...

Details Method of manufacturing combination type thin film magnetic... Method of manufacturing combination type thin film magnetic...

2006-11-07

2006-11-07

Kim, Paul D. (Department: 3729)

Metal working

Method of mechanical manufacture

Electrical device making

C029S603130, C029S603140, C029S603160, C029S603180, C205S199000, C205S122000, C216S062000, C216S065000, C216S066000, C360S125330, C360S317000, C427S127000, C427S128000, C451S005000, C451S041000

Reexamination Certificate

active

07131186

ABSTRACT:
On a surface of a bottom pole, a write gap film and first magnetic material film having a high saturation magnetic flux density are formed, and the first magnetic material film is etched to remain a portion extending from an air bearing surface to a throat height zero reference position and a first non-magnetic film is formed in a removed portion. The first non-magnetic material film is polished to obtain a flat surface which is coplanar with a surface of the first magnetic material film. A second magnetic material film having a high saturation magnetic flux density is formed on the flat surface. The second magnetic material film, first magnetic material film, write gap film and bottom pole are partially removed by RIE using a mask formed on the flat surface.

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