Image processing method, image processing apparatus and...

Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices

Reexamination Certificate

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C250S492300, C250S306000, C250S307000, C250S310000, C382S145000, C356S237100

Reexamination Certificate

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07145156

ABSTRACT:
An image processing method, which processes an image of a surface shape of a sample based on a detection quantity of secondary electrons obtained by irradiating a charged particle to the sample, comprises: extracting a reference profile, which indicates the detection quantity of the secondary electrons in a gray value, from an image of a reference area in the surface shape of the sample, the image of the reference area being used as a reference of an image processing; extracting an intended profile, which indicates the detection quantity of the secondary electrons in a gray value, from an image of an intended area in the surface shape of the sample, the image of the intended area being used as a target of image processing; and replacing the intended profile with the reference profile to correct the image in the intended area.

REFERENCES:
patent: 5331161 (1994-07-01), Ohdomari et al.
patent: 11-296680 (1999-10-01), None
patent: 2002-359271 (2002-12-01), None

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