Methods for forming capacitor structures

Details Methods for forming capacitor structures Methods for forming capacitor structures

2006-10-03

2006-10-03

Coleman, W. David (Department: 2823)

Semiconductor device manufacturing: process

Chemical etching

Combined with the removal of material by nonchemical means

C257SE21214

Reexamination Certificate

active

07115515

ABSTRACT:
The invention includes methods of forming capacitor structures and removing organic material. An organic material, such as a photoresist, is disposed on a substrate. The organic material is contacted with a chemical mechanical polishing pad and a polishing fluid to remove the organic material from the substrate. The polishing fluid can be essentially free of particles, and can be water.

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patent: 6468858 (2002-10-01), Lou
patent: 6706632 (2004-03-01), Sinha

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