Projection exposure apparatus and method

Details Projection exposure apparatus and method Projection exposure apparatus and method

2006-06-13

2006-06-13

Mathews, Alan (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C356S239200, C359S507000

Reexamination Certificate

active

07061575

ABSTRACT:
Pattern transfer can be performed with improved exposure accuracy, by reducing the contamination caused by the attachment of a photosensitive agent or the like on an optical member of a projection optical member or the like. The pattern transfer onto a substrate W is performed after cleaning the objective member OB disposed at a given position by a cleaning device8at the time when pattern transfer is not performed, or while making flow a gas in a space between the substrate W and the optical member OB by a contamination protection device98. Alternatively, the optical member OB disposed at a given position is inspected for contamination by a contamination inspection device84at the time when pattern transfer is not performed, and the pattern transfer or the cleaning or replacement of the optical member is performed based on the result.

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English translation of the Japanese patent document 09-298148 listed above.

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