Mask, substrate with light reflecting film, method for...

Optical: systems and elements – Optical modulator – Light wave directional modulation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C359S253000, C349S113000

Reexamination Certificate

active

06995898

ABSTRACT:
A substrate is provided with a light reflecting film in which the depths of a plurality of concave portions formed on the surface of the base or the heights of a plurality of convex portions formed on the surface of the base are substantially equal, the planar shapes of the plurality of concave portions or the convex portions are overlapped circles and overlapped polygons, or any one of the aforesaid circles and polygons, and a plurality of concave portions or convex portions are randomly arranged over a plane, the substrate with the light reflecting film being prepared by using a mask comprising light-transmitting parts or non-light-transmitting parts formed by a plurality of dots less than the number of the dot regions as one unit, in which the light-transmitting parts or the non-light-transmitting parts are randomly arranged in the unit, and a plurality of the one unit is repeated.

REFERENCES:
patent: 5940154 (1999-08-01), Ukita et al.
patent: 2002/0041350 (2002-04-01), Yamazaki et al.
patent: 08-152621 (1996-06-01), None
patent: 11-281972 (1999-10-01), None
patent: 2002-006774 (2002-01-01), None
patent: 2002-072184 (2002-03-01), None
Communication from Japanese Patent Office re: counterpart application.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Mask, substrate with light reflecting film, method for... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask, substrate with light reflecting film, method for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask, substrate with light reflecting film, method for... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3670794

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.