System and method for proximity effect correction in imaging...

Details System and method for proximity effect correction in imaging... System and method for proximity effect correction in imaging...

2006-12-12

2006-12-12

Berman, Jack (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S492200, 36, 36, C430S026000

Reexamination Certificate

active

07148496

ABSTRACT:
A system and method are disclosed for providing error correction in an imaging system. The system includes an error determination unit for determining an amount of error associated with a spot at (x,y) in a binary pattern to be imaged, a determination unit for determining the location of a nearest exposed spot at (xi, yi) for each spot at (x,y), and a dose modification unit for modifying an exposure dose at the nearest exposed spot at (xi, yi) for each spot at (x,y).

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patent: 6376132 (2002-04-01), Yamashita
patent: 6920368 (2005-07-01), Van Dyck et al.
patent: 1329771 (2003-07-01), None
patent: WO 01/76872 (2001-10-01), None

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