Generation and use of integrated circuit profile-based...

Data processing: structural design – modeling – simulation – and em – Simulating electronic device or electrical system

Reexamination Certificate

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C703S014000, C703S015000, C703S016000, C703S017000

Reexamination Certificate

active

07136796

ABSTRACT:
An exemplary method and system for generating integrated circuit (IC) simulation information regarding the effect of design and fabrication process decisionn includes creating and using a data store of profile-based information comprising metrology signal, structure profile data, process control parameters, and IC simulation attributes.An exemplary method and system for generating a simulation data store using signals off test gratings that model the effect of an IC design and/or fabrication process includes creating and using a simulation data store generated using test gratings that model the geometries of the IC interconnects. The interconnect simulation data store may be used in-line for monitoring electrical and thermal properties of an IC device during fabrication. Other embodiments include utilizing a metrology simulator and various combinations of a fabrication process simulator, a device simulator, and/or circuit simulator.

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Austrian Search and Examination Report mailed on Jan. 23, 2004, for Singapore patent application No. 200300820-8 filed on Feb. 27, 2003, 6 pages.

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