Radiant energy – Irradiation of objects or material – Irradiation of semiconductor devices
Reexamination Certificate
2006-08-01
2006-08-01
Berman, Jack I. (Department: 2881)
Radiant energy
Irradiation of objects or material
Irradiation of semiconductor devices
C700S057000, C716S030000, C716S030000, C430S394000
Reexamination Certificate
active
07084413
ABSTRACT:
The present subject matter allows non-orthogonal lines to be formed at the same thickness as the orthogonal lines so as to promote compact designs, to be formed with even line edges, and to be formed efficiently. One aspect of the present subject matter relates to a method for forming non-orthogonal images in a raster-based photolithographic system. According to various embodiments of the method, a first image corresponding to a first data set is formed on a reticle when the reticle is at a first rotational position θ1. The reticle is adjusted to a second rotational position θ2. A second image corresponding to a second data set is formed on the reticle when the reticle is at the second rotational position θ2. The second image is non-orthogonal with respect to the first image. Other aspects are provided herein.
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