Method and apparatus for performing field-to-field compensation

Details Method and apparatus for performing field-to-field compensation Method and apparatus for performing field-to-field compensation

2006-10-10

2006-10-10

Rodriguez, Paul (Department: 2123)

Data processing: generic control systems or specific application

Specific application, apparatus or process

Product assembly or manufacturing

C703S006000, C438S005000, C438S007000, C356S508000, C356S509000

Reexamination Certificate

active

07120514

ABSTRACT:
The present invention provides for a method and an apparatus for performing field-to-field compensation during semiconductor manufacturing. At least one semiconductor device is processed. Metrology data is collected from the processed semiconductor device. A field-to-field metrology analysis is performed based upon the metrology data. Residual-error analysis is performed based upon the field-to-field analysis.

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