Moving lens for immersion optical lithography

Details Moving lens for immersion optical lithography Moving lens for immersion optical lithography

2006-08-08

2006-08-08

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C355S077000, C250S491100

Reexamination Certificate

active

07088422

ABSTRACT:
An apparatus for immersion optical lithography having a lens capable of relative movement in synchrony with a horizontal motion of a semiconductor wafer in a liquid environment where the synchronous motion of the lens apparatus and semiconductor wafer advantageously reduces the turbulence and air bubbles associated with a liquid environment. The relative motions of the lens and semiconductor wafer are substantially the same as the scanning process occurs resulting in optimal image resolution with minimal air bubbles, turbulence, and disruption of the liquid environment.

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patent: 2002/0080226 (2002-06-01), Johnson
patent: 2004/0109237 (2004-06-01), Epple et al.
patent: 2005/0100745 (2005-05-01), Lin et al.

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