Method of precise laser nanomachining with UV ultrafast...

Electric heating – Metal heating – By arc

Reexamination Certificate

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C219S121670, C219S121700

Reexamination Certificate

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07057135

ABSTRACT:
A method for manufacturing a microstructure, which includes at least one feature having a dimension less than 200 nm, on a work piece. Pulses of UV laser light having a duration of less than about 1 ps and a peak wavelength of less than about 380 nm are generated. These pulses of UV laser light are focused to a substantially diffraction limited beam spot within a target area of the work piece. The fluence of this substantially diffraction limited beam spot in the target area of the work piece is controlled such that the diameter of the section of the target area machined by one of the pulses of UV laser light is less than 200 nm.

REFERENCES:
patent: 6552301 (2003-04-01), Herman et al.
patent: 6574250 (2003-06-01), Sun et al.
patent: 2003/0201578 (2003-10-01), Li et al.
C. Li et al., Micromachining with femtosecond 250nm laser pulses, Proceedings of SPIE vol. 4087, 2000, pp. 1194-1200.
Ming Li et al., Ultra-precision machining using fs fast Laser: An application for Photonic Crystal fabrication, Fs Ultra-maching Workshop, Mar. 5, 2003, (53 pgs.)
Li, Ming et al: “Femtosecond Laser Micromachining of Si-on-Si02 for Photonic Band Gap Crystal Fabrication”, Japanese Journal of Applied Physics, Tokyo, Japan, vol. 40, No. 5A, Part 1, May 2001, pp. 3476-3477, XP001078634, ISSN: 0021-4922.
Li, Ming et al: “Nanostructuring in submicron-level waveguides with femtosecond laser pulses”, Optics Communications, North-Holland Publishing Co, Amsterdam, NL, vol. 212, No. 1-3, Oct. 15, 2002, pp. 159-163, XP004386891, ISSN: 0030-4018.

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