Mask, substrate with light reflective film, method for...

Details Mask, substrate with light reflective film, method for... Mask, substrate with light reflective film, method for...

2006-06-13

2006-06-13

McPherson, John A. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

Reexamination Certificate

active

07060396

ABSTRACT:
A substrate is provided with a light reflective film including a base and a reflective layer, in which a plurality of concave portions or convex portions formed on the surface of the base are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or a whole screen unit, are formed using a mask in which light transmissive or non-transmissive portions are randomly arranged in the plane direction in 100 to 2,000 RGB dot units or the whole screen unit.

REFERENCES:
patent: 5408345 (1995-04-01), Mitsui et al.
patent: 2001/0010571 (2001-08-01), Kanou et al.
patent: 11-337964 (1999-12-01), None
patent: 2001-201742 (2001-07-01), None

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