Surface position detection apparatus and method, and...

Radiant energy – Photocells; circuits and apparatus – Photocell controls its own optical systems

Reexamination Certificate

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C250S559300, C355S053000

Reexamination Certificate

active

07141813

ABSTRACT:
An exposure apparatus for exposing a substrate moving in a scan direction to light directed via an original. The apparatus includes a projection optical system configured to image a pattern of the original on the substrate, a substrate stage configured to hold the substrate and to move, and a detector configured to detect a surface position of the substrate, held and moved in the scan direction at a scan speed by the substrate stage, in a direction parallel to an optical axis of the projection optical system over a detection region preset on the substrate. The apparatus further includes a controller configured to preset the detection region, to change a detection time over which the detector detects a surface position of the substrate based on a change in the scan speed of the substrate stage so that the detector detects a surface position of the substrate over the preset detection region, and to control at least one of a position and a tilt of the substrate stage with respect to the direction parallel to the optical axis based on a detection obtained by the detector.

REFERENCES:
patent: 5917580 (1999-06-01), Ebinuma et al.
patent: 5920398 (1999-07-01), Iwanaga et al.
patent: 6130751 (2000-10-01), Haginiwa et al.
patent: 6426508 (2002-07-01), Kosugi et al.
patent: 2001/0020687 (2001-09-01), Yamada et al.

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