Projection optical system, exposure apparatus, and device...

Details Projection optical system, exposure apparatus, and device... Projection optical system, exposure apparatus, and device...

2006-12-26

2006-12-26

Fuller, Rodney (Department: 2851)

Photocopying

Projection printing and copying cameras

Illumination systems or details

C359S649000

Reexamination Certificate

active

07154585

ABSTRACT:
Provided is a projection optical system for forming an image of a pattern of a first object (R) on a second object (W). The projection optical system is made of an optical material having a refractive index of not more than 1.6 and is substantially telecentric both on the first object side and on the second object side. The projection optical system satisfies the condition of (λ×L)/(NA×Y02)<1.5×10−3, where λ is a wavelength of light, L a distance between the first object and the second object, MA a numerical aperture on the second object side, and Y0a maximum image height on the second object.

REFERENCES:
patent: 5831715 (1998-11-01), Takahashi
patent: 6333781 (2001-12-01), Shigematsu
patent: 6862078 (2005-03-01), Suzuki
patent: 6864961 (2005-03-01), Omura
patent: 1 139 138 (2001-10-01), None
patent: A 11-352012 (1999-12-01), None
patent: A 200-75493 (2000-03-01), None
patent: WO 00/33138 (2000-06-01), None
patent: WO 02/31870 (2002-04-01), None

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