Micro-lenses and structures for increasing area coverage and...

Details Micro-lenses and structures for increasing area coverage and... Micro-lenses and structures for increasing area coverage and...

2006-02-07

2006-02-07

Dang, Hung Xuan (Department: 2873)

Optical: systems and elements

Single channel simultaneously to or from plural channels

C430S005000, C430S011000, C430S321000

Reexamination Certificate

active

06995911

ABSTRACT:
Micro-lenses for use in imagers and their method of manufacture from intermediate lens structures are described. Lithographic masks are used to remove unwanted portions from the intermediate lens structures and to remove cut-out portions from the intermediate lens structures to alter the radius of the resultant micro-lenses. Lithographic masks are also used to inhibit pull-back of the micro-lenses during a reflow step.

REFERENCES:
patent: 5561008 (1996-10-01), Berger et al.
patent: 5633527 (1997-05-01), Lear
patent: 6707612 (2004-03-01), Ohtsu et al.

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