Method and apparatus for monitoring and controlling imaging...

Details Method and apparatus for monitoring and controlling imaging... Method and apparatus for monitoring and controlling imaging...

2006-06-13

2006-06-13

Nguyen, Henry Hung (Department: 2851)

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C355S030000

Reexamination Certificate

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07061578

ABSTRACT:
A method of monitoring an immersion lithography system in which a wafer can be immersed in a liquid immersion medium for exposure by an exposure pattern. The method detects the presence of a foreign body in the immersion medium to thereby determine if the immersion medium in a state that is acceptable for exposing the wafer with the exposure pattern. Also disclosed is a monitoring and control system for an immersion lithography system.

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