Positive photoresist composition and method of forming...

Details Positive photoresist composition and method of forming... Positive photoresist composition and method of forming...

2006-11-07

2006-11-07

Chu, John S. (Department: 1752)

Radiation imagery chemistry: process, composition, or product th

Diazo reproduction, process, composition, or product

Composition or product which contains radiation sensitive...

C430S191000, C430S192000, C430S193000, C430S326000

Reexamination Certificate

active

07132213

ABSTRACT:
A positive photoresist composition comprising an alkali-soluble novolak resin (A) containing a structural unit (a1) represented by a general formula (I) shown below, and a structural unit (a2) represented by a general formula (II) shown below, and a photosensitizer (B)

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