Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Silver compound sensitizer containing
Reexamination Certificate
2006-08-01
2006-08-01
Chea, Thorl (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Silver compound sensitizer containing
C430S264000, C430S584000, C430S607000, C430S611000, C430S613000
Reexamination Certificate
active
07083908
ABSTRACT:
A photothermographic material including a substrate carrying on one surface thereof an image forming layer containing at least a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent for a silver ion, and a binder, wherein the photosensitive silver halide has a silver iodide content of 40 to 100 mol %, and an average particle size of 5 to 80 nm, and the photothermographic material contains a compound of the following general formula (1);in-line-formulae description="In-line Formulae" end="lead"?Q-(Y)n—C(Z1)(Z2)X General formula (1)in-line-formulae description="In-line Formulae" end="tail"?wherein Q represents a heterocycle, Y represents a divalent connecting group, n represents 0 or 1, Z1and Z1each represent a halogen atom, and X represents a hydrogen atom or an electron withdrawing group.
REFERENCES:
patent: 4332889 (1982-06-01), Siga et al.
patent: 5492803 (1996-02-01), Landgrebe et al.
patent: 5686228 (1997-11-01), Murray et al.
patent: 5747236 (1998-05-01), Farid et al.
patent: 5958668 (1999-09-01), Matsumoto et al.
patent: 5998126 (1999-12-01), Toya et al.
patent: 6090538 (2000-07-01), Arai et al.
patent: 6143488 (2000-11-01), Uytterhoeven et al.
patent: 6156491 (2000-12-01), Goto
patent: 6171767 (2001-01-01), Kong et al.
patent: 6174663 (2001-01-01), Kato
patent: 6265146 (2001-07-01), Kashiwagi
patent: 6274297 (2001-08-01), Uytterhoeven et al.
patent: 6413712 (2002-07-01), Yoshioka et al.
patent: 6645714 (2003-11-01), Oya et al.
patent: 6689554 (2004-02-01), Yamada et al.
patent: 6855488 (2005-02-01), Yamada et al.
patent: 0922995 (1999-06-01), None
patent: 2001-092075 (2001-04-01), None
U.S. Appl. No. 10/238,611, filed Sep. 11, 2002 entitled “Heat-Developable Photosensitive Material and Heat-Developing Method Using the Same”.
Ohzeki Tomoyuki
Okutsu Eiichi
Yamamoto Seiichi
Burke Margaret A.
Chea Thorl
Fuji Photo Film Co. , Ltd.
Moss Sheldon J.
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