Positive resist composition and pattern formation method...

Details Positive resist composition and pattern formation method... Positive resist composition and pattern formation method...

2006-10-17

2006-10-17

Wu, David W. (Department: 1713)

Synthetic resins or natural rubbers -- part of the class 520 ser

Synthetic resins

Processes of preparing a desired or intentional composition...

C430S921000, C430S905000, C526S319000, C526S320000, C524S556000, C524S560000

Reexamination Certificate

active

07122589

ABSTRACT:
A positive resist composition comprising: (A) a resin having alicyclic hydrocarbon groups in side chains, containing specified two types of repeating units, which increases the solubility in an alkali developing solution by the action of an acid; and (B) a particular sulfonium compound having a specified structure and capable of generating an acid upon irradiation with an actinic ray or radiation.

REFERENCES:
patent: 6348297 (2002-02-01), Uetani et al.
patent: 6440636 (2002-08-01), Ushirogouchi et al.
patent: 6733951 (2004-05-01), Kodama
patent: 9-73173 (A) (1997-03-01), None
patent: 11-119434 (A) (1999-04-01), None
patent: 2000-292917 (A) (2000-10-01), None
patent: 2001-294570 (A) (2001-10-01), None

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