Method of producing near field optical head

Details Method of producing near field optical head Method of producing near field optical head

2006-11-07

2006-11-07

Hassanzadeh, Parviz (Department: 1763)

Etching a substrate: processes

Forming or treating optical article

C216S011000

Reexamination Certificate

active

07132055

ABSTRACT:
In a method of producing a near field optical head, a transparent substrate has a surface and at least one protuberance extending from the surface. A shielding film is formed on the surface of the transparent substrate so that the shielding film covers the protuberance. A parent film for an air bearing surface is formed so as to cover the shielding film and the protuberance. A surface of the parent film is etched until an apex of the shielding film covering the protuberance and the surface of the parent film lie substantially on a common plane and the apex of the shielding film is exposed from the surface of the parent film while monitoring the existence/absence of an exposed portion of the apex. An optical aperture is formed at the apex of the shielding film by separately etching the shielding film using the parent film as a mask. The parent film is etched to form an air bearing surface.

REFERENCES:
patent: 5838005 (1998-11-01), Majumdar et al.
patent: 6046972 (2000-04-01), Kuroda et al.
patent: 2002/0001283 (2002-01-01), Niwa et al.

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