Semiconductor device manufacturing: process – With measuring or testing
Reexamination Certificate
2006-06-13
2006-06-13
Lee, Hsien-Ming (Department: 2823)
Semiconductor device manufacturing: process
With measuring or testing
C438S016000, C438S795000, C427S573000, C427S574000
Reexamination Certificate
active
07060514
ABSTRACT:
A process for forming a thin layer exhibiting a substantially uniform property on an active surface of a semiconductor substrate includes varying the temperature within a reaction chamber while a layer of a material is formed upon the semiconductor substrate. Varying the temperature within the reaction chamber facilitates temperature uniformity across the semiconductor wafer. As a result, a layer forming reaction occurs at a substantially consistent rate over the entire active surface of the semiconductor substrate. The process may also include oscillating the temperature within the reaction chamber while a layer of a material is being formed upon a semiconductor substrate.
REFERENCES:
patent: 4132818 (1979-01-01), Chappelow et al.
patent: 4395438 (1983-07-01), Chiang
patent: 4742020 (1988-05-01), Roy
patent: 4872947 (1989-10-01), Wang et al.
patent: 4963506 (1990-10-01), Liaw et al.
patent: 4986877 (1991-01-01), Tachi et al.
patent: 5034688 (1991-07-01), Moulene et al.
patent: 5231356 (1993-07-01), Parker
patent: 5400739 (1995-03-01), Kao et al.
patent: 5436172 (1995-07-01), Moslehi
patent: 5482739 (1996-01-01), Hey et al.
patent: 5551985 (1996-09-01), Brors et al.
patent: 5571603 (1996-11-01), Utumi et al.
patent: 5607773 (1997-03-01), Ahlburn et al.
patent: 5618761 (1997-04-01), Eguchi et al.
patent: 5635409 (1997-06-01), Moslehi
patent: 5776557 (1998-07-01), Okano et al.
patent: 5790750 (1998-08-01), Anderson
patent: 5830277 (1998-11-01), Johnsgard et al.
patent: 5932286 (1999-08-01), Beinglass et al.
patent: 5970383 (1999-10-01), Lee
patent: 5976990 (1999-11-01), Mercaldi et al.
patent: 5989718 (1999-11-01), Smith et al.
patent: 6083852 (2000-07-01), Cheung et al.
patent: 6162488 (2000-12-01), Gevelber et al.
patent: 6352591 (2002-03-01), Yieh et al.
patent: 6833280 (2004-12-01), Mercaldi et al.
patent: 10-206020 (1998-08-01), None
Mercaldi Garry Anthony
Powell Don Carl
Lee Hsien-Ming
Micro)n Technology, Inc.
TraskBritt
LandOfFree
Process for fabricating films of uniform properties on... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Process for fabricating films of uniform properties on..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Process for fabricating films of uniform properties on... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3637198