Chemical mechanical polishing and pad dressing method

Details Chemical mechanical polishing and pad dressing method Chemical mechanical polishing and pad dressing method

2006-02-28

2006-02-28

Morgan, Eileen P. (Department: 3723)

Abrading

Abrading process

With tool treating or forming

C451S041000, C451S063000, C451S287000, C451S443000

Reexamination Certificate

active

07004822

ABSTRACT:
The invention provides a chemical mechanical polishing and pad dressing method based on differing the rotational of a pad dresser, head, and/or polishing pad to improve center removal slow profiling.

REFERENCES:
patent: 5700180 (1997-12-01), Sandhu et al.
patent: 5782675 (1998-07-01), Southwick
patent: 6200207 (2001-03-01), Hsu
patent: 6306008 (2001-10-01), Moore
patent: 6530827 (2003-03-01), Mitsuhashi
patent: 6632127 (2003-10-01), Zimmer et al.

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