Mask, substrate with light reflection film, manufacturing...

Optical: systems and elements – Optical modulator – Light wave directional modulation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C349S113000, C349S114000

Reexamination Certificate

active

07085036

ABSTRACT:
A substrate is provided with a light reflection film in which the heights of a plurality of convex portions or the depths of concave portions formed on a base material are specified to be substantially the same. The two-dimensional shapes of the plurality of convex portions or concave portions are specified to be the two-dimensional shapes of independent circles and polygons, or of either of them. In addition, the plurality of convex portions or concave portions are arranged in the direction of the plane on a random basis. The substrate is formed using a mask in which light transmission portions or light non-transmission portions are formed in units of dots, the number thereof being smaller than the number of dot regions. The dots are arranged irregularly in each of the units, and a plurality of units are included.

REFERENCES:
patent: 5204765 (1993-04-01), Mitsui et al.
patent: 5408345 (1995-04-01), Mitsui et al.
patent: 5418635 (1995-05-01), Mitsui et al.
patent: 5453855 (1995-09-01), Nakamura et al.
patent: 5724111 (1998-03-01), Mizobata et al.
patent: 5940154 (1999-08-01), Ukita et al.
patent: 6104460 (2000-08-01), Abe et al.
patent: 6313895 (2001-11-01), Tsuda et al.
patent: 6538711 (2003-03-01), Funahata et al.
patent: 6665030 (2003-12-01), Hanazawa et al.
patent: 6747718 (2004-06-01), Kanou et al.
patent: 6784957 (2004-08-01), Kanou et al.
patent: 6943856 (2005-09-01), Yamaguchi et al.
patent: 6950159 (2005-09-01), Kubo et al.
patent: 2002/0041350 (2002-04-01), Yamazaki et al.
patent: 2003/0103178 (2003-06-01), Sakamoto et al.
patent: 2003/0218698 (2003-11-01), Otake et al.
patent: 1 156 359 (2001-11-01), None
patent: 05-323371 (1993-12-01), None
patent: 08-95071 (1996-04-01), None
patent: 11-237623 (1999-08-01), None
patent: 11-242217 (1999-09-01), None
patent: 11-337964 (1999-10-01), None
patent: 2000-075132 (2000-03-01), None
patent: 2000-180833 (2000-06-01), None
patent: 2000-284272 (2000-10-01), None
patent: 2000-189542 (2000-11-01), None
patent: 2001-005015 (2001-01-01), None
patent: 2001-154371 (2001-06-01), None
patent: 2001-194662 (2001-07-01), None
patent: 2001-201742 (2001-07-01), None
patent: 2001-290169 (2001-10-01), None
patent: 2002-14211 (2002-01-01), None
patent: 2002-072184 (2002-03-01), None
patent: 2002-258278 (2002-09-01), None
patent: 2003-149662 (2003-05-01), None
patent: WO 01/38932 (2001-05-01), None
Examination Report issued on Aug. 24, 2004 for the corresponding Japanese Publication No. 2002-108528.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Mask, substrate with light reflection film, manufacturing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Mask, substrate with light reflection film, manufacturing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask, substrate with light reflection film, manufacturing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3631654

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.