Methods for removing doped silicon material from...

Details Methods for removing doped silicon material from... Methods for removing doped silicon material from...

2006-05-09

2006-05-09

Wilson, Lee D. (Department: 3723)

Abrading

Abrading process

Glass or stone abrading

C451S036000, C451S060000, C451S063000, C451S288000, C451S289000, C451S446000, C051S308000, C051S309000

Reexamination Certificate

active

07040965

ABSTRACT:
Methods for removing material from microfeature workpieces are disclosed. A method in accordance with one embodiment of the invention includes disposing a surfactant-bearing polishing liquid between a doped silicon material of the microfeature workpiece and a polishing pad material. At least one of the workpiece and the polishing pad material is moved relative to the other to simultaneously and uniformly remove at least some of the doped silicon material from portions of the workpiece having different crystalinities and/or different doping characteristics. The surfactant can include a generally non-ionic surfactant having a relatively low concentration in the polishing liquid, for example, from about 0.001% to about 1.0% by weight.

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