Apparatus and method for drying semiconductor wafers using...

Details Apparatus and method for drying semiconductor wafers using... Apparatus and method for drying semiconductor wafers using...

2006-11-07

2006-11-07

Gravini, S. (Department: 3749)

Drying and gas or vapor contact with solids

Apparatus

Sheet, web, or strand

C034S646000, C134S902000

Reexamination Certificate

active

07131217

ABSTRACT:
An apparatus for drying semiconductor wafers includes a bath for receiving semiconductor wafers and for holding a fluid, a chamber for providing an area where vapor is flowable over the bath, a supply pipeline for supplying vapor to the chamber, a vapor discharging pipeline for expunging vapor in the chamber, a fluid discharging pipeline for draining fluid in the chamber therefrom, and a protector for maintaining a distance between the semiconductor wafers during a drying process.

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