Sealing porous dielectrics with silane coupling reagents

Details Sealing porous dielectrics with silane coupling reagents Sealing porous dielectrics with silane coupling reagents

2006-10-17

2006-10-17

Ahmed, Shamim (Department: 1765)

Semiconductor device manufacturing: process

Chemical etching

Vapor phase etching

C438S693000, C438S723000, C438S780000, C216S046000, C216S079000

Reexamination Certificate

active

07122481

ABSTRACT:
A method and structure for sealing porous dielectrics using silane coupling reagents is herein described. A sealant chain (silane coupling reagent) is formed from at least silicon, carbon, oxygen, and hydrogen and exposed to a porous dielectric material, wherein the sealant chain reacts with a second chain, that has at least oxygen and is present in the porous dielectric defining the pores, to form a continuous layer over the surface of the porous dielectric.

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