Method for inspecting exposure apparatus

Details Method for inspecting exposure apparatus Method for inspecting exposure apparatus

2006-06-13

2006-06-13

Nguyen, Tu T. (Department: 2877)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

Reexamination Certificate

active

07061603

ABSTRACT:
Light emitted from an illumination optical system is guided to a photomask where a pattern is formed of an optical member including a light transmission pattern as a diffraction grating pattern, in which a light transmission part and a opaque part are repeated in a finite period and a periphery of the light transmission pattern is shielded by a opaque area, such that a plurality of ratios are given between the light transmission part and the opaque part. Diffraction light, which has passed through the photomask, is irradiated on a projection optical system, thereby to transfer a pattern reflecting an intensity distribution of the diffraction light to a wafer. A change of transmittance depending on a light path of the projection optical system is measured, based on a pattern image of the diffraction light transferred to the wafer. Pattern transfer is carried out in a non-conjugate state.

REFERENCES:
patent: 4906081 (1990-03-01), Yasuda
patent: 5493402 (1996-02-01), Hirukawa
patent: 5510892 (1996-04-01), Mizutani et al.
patent: 5973771 (1999-10-01), Hibbs et al.
patent: 6100970 (2000-08-01), Yoshino et al.
patent: 6317198 (2001-11-01), Sato et al.
patent: 6492649 (2002-12-01), Nei et al.
patent: 2000-21732 (2000-01-01), None

Affiliated with

Also associated with

Rating

Method for inspecting exposure apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method for inspecting exposure apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for inspecting exposure apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3615449