Photocopying – Projection printing and copying cameras – Step and repeat
Reexamination Certificate
2006-03-07
2006-03-07
Mathews, Alan (Department: 2851)
Photocopying
Projection printing and copying cameras
Step and repeat
C355S067000, C355S071000, C355S077000
Reexamination Certificate
active
07009681
ABSTRACT:
An exposure apparatus includes a projection optical system for exposing and transferring a pattern on a mask onto an object, an illumination optical system for forming a secondary light source surface approximately conjugate with a pupil in the projection optical system, and for illuminating the mask, and a mechanism for making non-uniform at least one of a transmittance distribution from the secondary light source to the object and a light intensity distribution on the secondary light source surface.
REFERENCES:
patent: 4947030 (1990-08-01), Takahashi
patent: 5659429 (1997-08-01), Kudo
patent: 5726739 (1998-03-01), Hayata
patent: 6051842 (2000-04-01), Yamamoto
patent: 6127095 (2000-10-01), Kudo
patent: 6281964 (2001-08-01), Sato
patent: 6285442 (2001-09-01), Sato
patent: 6333777 (2001-12-01), Sato
patent: 6466303 (2002-10-01), Omura et al.
patent: 6560044 (2003-05-01), Shinoda
patent: 6563567 (2003-05-01), Komatsuda et al.
patent: 6614597 (2003-09-01), Mizouchi
patent: 2003/0021579 (2003-01-01), Shinoda
patent: 2003/0038937 (2003-02-01), Sato
patent: 1014196 (2000-06-01), None
patent: 07-176475 (1995-07-01), None
patent: A09-027450 (1997-01-01), None
patent: A09-036026 (1997-02-01), None
patent: 10-303123 (1998-11-01), None
patent: 11-87232 (1999-03-01), None
patent: A11-087232 (1999-03-01), None
patent: 11-317348 (1999-11-01), None
patent: 11-317349 (1999-11-01), None
patent: 11-354424 (1999-12-01), None
patent: 2000-3852 (2000-01-01), None
patent: A2000-195778 (2000-07-01), None
patent: A2000-260968 (2000-09-01), None
patent: 2001-250762 (2001-09-01), None
patent: 2001-284236 (2001-10-01), None
patent: 2003-100622 (2003-04-01), None
English translation of the Japanese Patent Document 11-087232 cited on Applicant's IDS.
English translation of the Japanese Patent Document 2000-195778 cited on Applicant's IDS.
English translation of JPLO 11-354424.
English translation of JPLO 2001-284236.
An Office Action from the Patent Office of the People's Republic of China for Appl. No. 031041078 dated Oct. 1, 2004. (7 pages).
English translation of the Office Action from the Patent Office of the People's Republic of China for Appl. No. 031041078 dated Oct. 1, 2004. (3 pages).
English translation of Japanese Office action dated Feb. 8, 2005 for Appl. No. 2002-034851.
Mathews Alan
Morgan & Finnegan , LLP
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