Thin film transistor and method of fabricating the same

Active solid-state devices (e.g. – transistors – solid-state diode – Non-single crystal – or recrystallized – semiconductor... – Non-single crystal – or recrystallized – material containing...

Reexamination Certificate

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Details

C257S052000, C257S055000, C257S059000, C257S063000, C257S064000, C257S066000

Reexamination Certificate

active

07015507

ABSTRACT:
Provided is a non-single-crystal germanium thin film transistor having a gate insulating film capable of reducing the interface state density between an active layer and the gate insulating film. This thin film transistor has an active layer made of a non-single-crystal germanium film, and a gate oxide film substantially made of zirconium oxide or hafnium oxide.

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