Active solid-state devices (e.g. – transistors – solid-state diode – Thin active physical layer which is – Heterojunction
Reexamination Certificate
2006-08-22
2006-08-22
Ho, Tu-Tu (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Thin active physical layer which is
Heterojunction
C257S067000, C257S069000, C257S347000, C257SE29193
Reexamination Certificate
active
07095043
ABSTRACT:
An (SiGe)C layer having a stoichiometric ratio of about 1:1 is locally formed on an Si layer, a large forbidden band width semiconductor device is prepared inside the layered structure thereof and an Si semiconductor integrated circuit is formed in the regions not formed with the layered structure, whereby high frequency high power operation of the device is enabled by the large forbidden band width semiconductor device and high performance is attained by hybridization of the Si integrated circuit.
REFERENCES:
patent: 2001/0045604 (2001-11-01), Oda et al.
patent: 2002/0146892 (2002-10-01), Notsu et al.
patent: 9-283533 (1997-10-01), None
patent: 2798576 (1998-07-01), None
J. Kouvetakis, et al., “Novel Chemical Routes to Silicon-Germanium-Carbon Materials”, Appl. Phys. Lett., vol. 65,No. 23, Dec. 5, 1994, pp. 2960-2962.
Miura Makoto
Oda Katsuya
Sugii Nobuyuki
Suzumura Isao
Washio Katsuyoshi
Antonelli, Terry Stout and Kraus, LLP.
Hitachi , Ltd.
Ho Tu-Tu
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