Method and materials for purifying hydride gases, inert...

Details Method and materials for purifying hydride gases, inert... Method and materials for purifying hydride gases, inert...

2006-04-25

2006-04-25

Lawrence, Frank M. (Department: 1724)

Gas separation: processes

Solid sorption

C096S108000, C502S415000, C423S628000

Reexamination Certificate

active

07033418

ABSTRACT:
A process for removing trace amounts of moisture and/or one or more impurities from contaminated hydride, inert and non-reactive gases, thus decreasing the concentration of the impurities to parts-per-billion (ppb) or parts-per-trillion (ppt) levels. The gas purifier materials of this invention include thermally activated aluminas, said aluminas including organic alumina materials, modified organic alumina materials, and modified inorganic aluminas. The thermally activated alumina materials of this invention are activated by heating the alumina material at a temperature between about 50° C.–1000° C. in an inert or non-inert atmosphere or in a vacuum and maintaining the activated material in the inert or non-inert atmosphere or in a vacuum atmosphere subsequent to said activation but prior to use.

REFERENCES:
patent: 2915365 (1959-12-01), Saussol
patent: 3557025 (1971-01-01), Emerson et al.
patent: 3623993 (1971-11-01), Pearson
patent: 3950507 (1976-04-01), Boreskov et al.
patent: 4433981 (1984-02-01), Slaugh et al.
patent: 4493715 (1985-01-01), Hogan et al.
patent: 4617035 (1986-10-01), Wakaizumi et al.
patent: 4639259 (1987-01-01), Pearson
patent: 4889838 (1989-12-01), Lewis et al.
patent: 5055019 (1991-10-01), Meyer et al.
patent: 5211758 (1993-05-01), Ota
patent: 5531971 (1996-07-01), Tom et al.
patent: 5595954 (1997-01-01), Lee et al.
patent: 5837634 (1998-11-01), McLaughlin et al.
patent: 5846295 (1998-12-01), Kalbassi et al.
patent: 5917136 (1999-06-01), Gaffney et al.
patent: 6059859 (2000-05-01), Alvarez, Jr. et al.
patent: 6131368 (2000-10-01), Tramposch et al.
patent: 6379430 (2002-04-01), Monereau
patent: 6425946 (2002-07-01), Funke et al.
patent: 6632368 (2003-10-01), Blachman et al.
patent: 6884406 (2005-04-01), Sato et al.
patent: 8700032 (1988-08-01), None
patent: 0766991 (1997-09-01), None
patent: 04124001 (1992-04-01), None
patent: 04124001 (1992-04-01), None
patent: WO 00/20330 (2000-04-01), None
Takuya Ikeda, et al. “The elimination of H2O and SiH4in AsH3,”Journal of Crystal Growth124 (1992) 272-277.
Tadaharu Watanabe, et al. “Adsorption of diborane and hydrogen selenide on porous alumina and silica,”Journal of Materials Science: Materials in Electronics, 9 (1998) 127-132.

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