Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1995-12-27
1997-04-15
Young, Christopher G.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430192, 430193, G03F 7023
Patent
active
056208286
ABSTRACT:
A positive photoresist composition is disclosed, which comprises prescribed amounts of an alkali-soluble novolak resin which is obtained from prescribed amounts of m- and p-cresols and at least one xylenol selected from 2,3-, 3,4- and 3,5-xylenols and an aldehyde, a 1,2-quinonediazide compound which is an esterified product of a polyhydroxy compound having from 3 to 7 phenolic hydroxyl groups in the molecule with 1,2-naphthoquinonediazido-5(and/or 4)-sulfonyl chloride(s) and an alkali dissolution accelerator which is a polyhydroxy compound having a molecular weight of 1,000 or less and from 2 to 7 phenolic hydroxyl groups in the molecule.
REFERENCES:
patent: 5366843 (1994-12-01), Jeffries, III
patent: 5460917 (1995-10-01), Kobayashi et al.
patent: 5478691 (1995-12-01), Miyashita et al.
patent: 5494773 (1996-02-01), Tan et al.
Kawabe Yasumasa
Tan Shiro
Fuji Photo Film Co. , Ltd.
Young Christopher G.
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