Image analysis – Applications – Manufacturing or product inspection
Reexamination Certificate
2006-09-05
2006-09-05
Chawan, Sheela (Department: 2624)
Image analysis
Applications
Manufacturing or product inspection
C382S199000, C382S205000, C250S553000, C250S559300
Reexamination Certificate
active
07103209
ABSTRACT:
Noted portions of an image, such as a pin point hole in an isolated area or a pattern contour that forms a continuous boundary area, are clearly displayed by first erasing background noise by acquiring information regarding differences between an image detection signal (pixel) of each scanned position (dot) in matrix form and image detection signals of the surrounding scanned positions, and secondly, by adopting a value that is either a largest or smallest value greater than or equal to zero among a plurality of sets of information on value differences as new image information for the scanned position.
REFERENCES:
patent: 4908872 (1990-03-01), Toriu et al.
patent: 5887080 (1999-03-01), Tsubusaki et al.
patent: 6282309 (2001-08-01), Emery
patent: 6396943 (2002-05-01), Yamashita
patent: 6697497 (2004-02-01), Jensen et al.
Adams & Wilks
Chawan Sheela
SII NanoTechnology Inc.
LandOfFree
Method for extracting objective image does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method for extracting objective image, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method for extracting objective image will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3596984