Low resistance indium oxide films

Details Low resistance indium oxide films Low resistance indium oxide films

1983-11-30

1985-04-23

Demers, Arthur P.

Chemistry: electrical and wave energy

Processes and products

Vacuum arc discharge coating

204192R, 204192C, 204192SP, 428630, C23C 1500

Patent

active

045128642

ABSTRACT:
A method for depositing an indium oxide film by magnetron sputtering is disclosed wherein the resistance of the film is lowered by maintaining the substrate at an elevated temperature during the magnetron sputtering process.

REFERENCES:
patent: 3907660 (1975-09-01), Gillery
patent: 4094763 (1978-06-01), Gillery et al.
patent: 4166018 (1979-08-01), Chapin
patent: 4201649 (1980-05-01), Gillery

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