Photomask, method for manufacturing the same, and method for...

Details Photomask, method for manufacturing the same, and method for... Photomask, method for manufacturing the same, and method for...

2006-07-04

2006-07-04

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

C430S005000, C430S022000

Reexamination Certificate

active

07070891

ABSTRACT:
Provided are a photomask, a method for manufacturing the photomask and a method for measuring optical characteristics of a wafer exposure system, the measuring method using the photomask during manufacture. The photomask includes a substrate and a measuring pattern including a light opaque region pattern formed on the substrate and a plurality of light transmitting region patterns that are formed in regions divided by the light opaque region pattern and provoke phase shifts to provide phase differences to light transmitted through light transmitting regions. Precise measurements of the degree of a focus and lens aberrations of an exposure system using the photomask are obtained.

REFERENCES:
patent: 6042972 (2000-03-01), Schulze
patent: 6171739 (2001-01-01), Spence et al.
patent: 6866975 (2005-03-01), Wu

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