Optics: measuring and testing – Inspection of flaws or impurities
Reexamination Certificate
2006-03-14
2006-03-14
Toatley, Jr., Gregory J. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
C356S614000, C356S615000, C356S237200, C250S559080, C250S559340
Reexamination Certificate
active
07012682
ABSTRACT:
Manufacturing lines include inspection systems for monitoring the quality of parts produced. Manufacturing lines for making semiconductor devices generally inspect each fabricated part. The information obtained is used to fix manufacturing problems in the semiconductor fab plant. A machine-vision system for imaging an object having a first side and a second side includes an imager, and an optics apparatus that images two or more views of the first side of the object and images two or more views of the second side of the object. The two or more views of the first side and the second side of the object are each from different angles. The object includes at least one major surface. A divider background surface is placed near the at least one major surface of the object to obtain separate images of features of the object on the first side of the object and features of the object on the second side of the object. In one embodiment, the divider diffuses light to back light the features on the object on the first side and back light the features on the second side of the object.
REFERENCES:
patent: 4654949 (1987-04-01), Pryor
patent: 4959898 (1990-10-01), Landman et al.
patent: 5131753 (1992-07-01), Pine et al.
patent: 5452080 (1995-09-01), Tomiya
patent: 5563703 (1996-10-01), Lebeau et al.
patent: 5621530 (1997-04-01), Marrable, Jr.
patent: 5812269 (1998-09-01), Svetkoff et al.
patent: 5812693 (1998-09-01), Burt et al.
patent: 5864405 (1999-01-01), Ikeno
patent: 5872051 (1999-02-01), Fallon et al.
patent: 5909285 (1999-06-01), Beaty et al.
patent: 5995220 (1999-11-01), Suzuki
patent: 6075883 (2000-06-01), Stern et al.
patent: 6084631 (2000-07-01), Tonkin et al.
patent: 6141040 (2000-10-01), Toh
patent: 6163946 (2000-12-01), Pryor
patent: 6165885 (2000-12-01), Gaynes et al.
patent: 6242756 (2001-06-01), Toh et al.
patent: 6243164 (2001-06-01), Baldwin et al.
patent: 6307210 (2001-10-01), Suzuki et al.
patent: 6518997 (2003-02-01), Chow et al.
patent: 6532063 (2003-03-01), Tan et al.
patent: 6573987 (2003-06-01), Shires
patent: 6713311 (2004-03-01), Wong
Lemaire Charles A.
Lemaire Charles A.
Lemaire Patent Law Firm, P.L.L.C.
Nguyen Sang H.
Toatley , Jr. Gregory J.
LandOfFree
Co-planarity examination method and optical module for... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Co-planarity examination method and optical module for..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Co-planarity examination method and optical module for... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3594414