Abrading – Abrading process – Utilizing fluent abradant
Reexamination Certificate
2006-05-09
2006-05-09
Nguyen, George (Department: 3723)
Abrading
Abrading process
Utilizing fluent abradant
C451S053000, C451S075000, C451S089000, C134S009000
Reexamination Certificate
active
07040961
ABSTRACT:
A plasma assisted cryogenic cleaner for and a method of performing cleaning of a surface that must be substantially free of contaminants has a resiliently mounted nozzle for spraying a cryogenic cleaning medium on the surface. The cleaning is conducted by applying to the substrate surface a mixture of gases selected from the group consisting of oxygen, nitrogen, hydrogen, fluorine, hydrofluorocarbon or a mixture of such gases to both remove the photoresist layer and alter the composition of the residues such that the residues are soluble in water and/or have a weakened bonds that they can be removed with a stream of cryogenic medium. The cryogenic and plasma processes can be performed sequentially or simultaneously. In certain embodiments, the cryogenic cleaning medium nozzle is driven in an oscillatory or vibratory manner so the nozzle spray is delivered in a manner to provide pulsing of the spray and to provide as “snow plow” effect on contaminants as the spray delivers the cleaning medium against the surface. The surface may be transported past the nozzle, and the cleaning may occur in an enclosed controlled environment.
REFERENCES:
patent: 4466946 (1984-08-01), Goddin
patent: 4793103 (1988-12-01), Baumgart
patent: 4806171 (1989-02-01), Whitlock et al.
patent: 4854091 (1989-08-01), Hashish
patent: 4962891 (1990-10-01), Layden
patent: 5015331 (1991-05-01), Powell
patent: 5049365 (1991-09-01), Okabayashi
patent: 5062898 (1991-11-01), McDermott et al.
patent: 5074083 (1991-12-01), Kanno
patent: 5107764 (1992-04-01), Gasparrini
patent: 5108512 (1992-04-01), Goffnett et al.
patent: 5209028 (1993-05-01), McDermott et al.
patent: 5217925 (1993-06-01), Ogawa et al.
patent: 5315793 (1994-05-01), Peterson et al.
patent: 5354384 (1994-10-01), Sneed et al.
patent: 5364472 (1994-11-01), Heyns et al.
patent: 5366156 (1994-11-01), Bauer
patent: 5378312 (1995-01-01), Gifford
patent: 5380401 (1995-01-01), Jones
patent: 5417768 (1995-05-01), Smith, Jr. et al.
patent: 5456629 (1995-10-01), Bingham
patent: 5456759 (1995-10-01), Stanford
patent: 5482564 (1996-01-01), Douglas et al.
patent: 5505219 (1996-04-01), Lansberry
patent: 5514024 (1996-05-01), Goenka
patent: 5564159 (1996-10-01), Treiber
patent: 5571335 (1996-11-01), Lloyd
patent: 5616067 (1997-04-01), Goenka
patent: 5620673 (1997-04-01), Herden
patent: 5632150 (1997-05-01), Henzler
patent: 5651723 (1997-07-01), Bjornard
patent: 5651834 (1997-07-01), Jon et al.
patent: 5669251 (1997-09-01), Townsend et al.
patent: 5715852 (1998-02-01), Jepsen
patent: 5733174 (1998-03-01), Bingham et al.
patent: 5754580 (1998-05-01), Kotani et al.
patent: 5765578 (1998-06-01), Brandt et al.
patent: 5766061 (1998-06-01), Bowers
patent: 5766368 (1998-06-01), Bowers
patent: 5775127 (1998-07-01), Zito
patent: 5794854 (1998-08-01), Yie
patent: 5795831 (1998-08-01), Nakayama et al.
patent: 5804826 (1998-09-01), Borden et al.
patent: 5806544 (1998-09-01), Kosic
patent: 5810942 (1998-09-01), Narayanswami
patent: 5833918 (1998-11-01), Matossian et al.
patent: 5836809 (1998-11-01), Kosic
patent: 5837064 (1998-11-01), Bowers
patent: 5853128 (1998-12-01), Bowen et al.
patent: 5853962 (1998-12-01), Bowers
patent: 5858107 (1999-01-01), Chao et al.
patent: 5863170 (1999-01-01), Boitnott et al.
patent: 5882489 (1999-03-01), Bersin et al.
patent: 5908319 (1999-06-01), Xu et al.
patent: 5914278 (1999-06-01), Boitnott et al.
patent: 5928434 (1999-07-01), Goenka
patent: 5931721 (1999-08-01), Rose et al.
patent: 5961732 (1999-10-01), Patrin et al.
patent: 5967156 (1999-10-01), Rose
patent: 5976264 (1999-11-01), McCullough
patent: 5989355 (1999-11-01), Brandt et al.
patent: 6004399 (1999-12-01), Wong
patent: 6066032 (2000-05-01), Borden et al.
patent: 6099396 (2000-08-01), Krone-Schmidt
patent: 6126524 (2000-10-01), Shepherd
patent: 6187684 (2001-02-01), Farber et al.
patent: 6200393 (2001-03-01), Romack
patent: 6203406 (2001-03-01), Rose
patent: 6273790 (2001-08-01), Neese et al.
patent: 6280585 (2001-08-01), Obinata et al.
patent: 6296716 (2001-10-01), Haerle
patent: 6303047 (2001-10-01), Aronowitz et al.
patent: 6391700 (2002-05-01), Tsay
patent: 6412497 (2002-07-01), Li et al.
patent: 6530823 (2003-03-01), Ahmadi
patent: 6531436 (2003-03-01), Sahbari
patent: 6536059 (2003-03-01), McClain
patent: 6543462 (2003-04-01), Lewis et al.
patent: 6558475 (2003-05-01), Jur et al.
patent: 6562683 (2003-05-01), Wang et al.
patent: 6565667 (2003-05-01), Haerle et al.
patent: 6572457 (2003-06-01), DePalma
patent: 6719613 (2004-04-01), Ahmadi
patent: 6764385 (2004-07-01), Boumerzoug et al.
patent: 6838015 (2005-01-01), Cotte
patent: 6945853 (2005-09-01), Ahmadi
patent: 6949145 (2005-09-01), Banerjee
High Pressure Cleaning System for Disks, IBM Technical Disclosure Bulletin, Jan. 1983.
Boumerzoug Mohamed
Makhamreh Khalid
Tannous Adel George
Loudermilk & Associates
Nanoclean Technologies, Inc.
Nguyen George
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