Solid via layer to layer interconnect

Metal working – Method of mechanical manufacture – Electrical device making

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C029S830000, C029S832000, C029S846000, C156S295000, C174S262000

Reexamination Certificate

active

07076869

ABSTRACT:
The present invention relates to a method for providing an interconnect between layers of a multilayer circuit board. A first via extending through a total thickness of a first layer is formed. The first via is totally filled with a first solid conductive plug and an end of the first solid conductive plug includes a first contact pad that is in contact with a surface of the first layer. A second via extending through a total thickness of a second layer is formed. The second via totally filling with a second solid conductive plug and an end of the second solid conductive plug includes a second contact pad that is in contact with a surface of the second layer. The second layer is electrically and mechanically coupled to the first layer by an electrically conductive adhesive that is in electrical and mechanical contact with both the end of the first plug and the end of the second plug.

REFERENCES:
patent: 4249302 (1981-02-01), Crepeau
patent: 4967314 (1990-10-01), Higgins, III
patent: 5191174 (1993-03-01), Chang et al.
patent: 5237130 (1993-08-01), Kulesza et al.
patent: 5282312 (1994-02-01), DiStefano et al.
patent: 5444189 (1995-08-01), Nakaso et al.
patent: 5543585 (1996-08-01), Booth et al.
patent: 5545429 (1996-08-01), Booth et al.
patent: 5576519 (1996-11-01), Swamy
patent: 5699613 (1997-12-01), Chong et al.
patent: 5734560 (1998-03-01), Kamperman et al.
patent: 6013876 (2000-01-01), Caporizzo
patent: 6023029 (2000-02-01), Armezzani et al.
patent: 6051093 (2000-04-01), Tsukahara
patent: 6106891 (2000-08-01), Kulesza et al.
patent: 6323439 (2001-11-01), Kambe et al.
patent: 0 955 795 (1999-11-01), None
Multilayer Substrate With Low Coefficient of Thermal Expansion, Nakamura et al., 2000 International Symposium on Microelect, pp. 235-240.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Solid via layer to layer interconnect does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Solid via layer to layer interconnect, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Solid via layer to layer interconnect will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3591550

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.