Semiconductor device having multilayer interconnection...

Active solid-state devices (e.g. – transistors – solid-state diode – Combined with electrical contact or lead – Of specified material other than unalloyed aluminum

Reexamination Certificate

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Details

C257S758000, C257S759000, C257S773000, C257S774000, C438S629000, C438S637000, C438S640000, C438S666000, C438S701000

Reexamination Certificate

active

07019400

ABSTRACT:
A semiconductor device having a multilayer interconnection structure includes a chip semiconductor substrate, a plurality of interlayer insulating layers disposed on the chip semiconductor substrate, a circuit section disposed on the chip semiconductor substrate, and a plurality of walls that extend through the interlayer insulating layers and are arranged along the peripheral portions of the chip semiconductor substrate such that the walls surround the circuit section. The walls include upper sub-walls and lower sub-walls. The upper sub-walls extend through one of the interlayer insulating layers and further extend into another one of the interlayer insulating layers disposed under the layer through which the upper sub-walls extend. The lower sub-walls extend through one of the interlayer insulating layers disposed under the layer through which the upper sub-walls extend. Lower portions of the upper sub-walls each extend into corresponding upper portions of the lower sub-walls.

REFERENCES:
patent: 6040243 (2000-03-01), Li et al.
patent: 2002/0024115 (2002-02-01), Ibnabdeljalil et al.
patent: 2002/0125577 (2002-09-01), Komada
patent: 2003/0157794 (2003-08-01), Agarwala et al.
patent: 2003/0227089 (2003-12-01), Watanabe et al.
patent: 2004/0150073 (2004-08-01), Matumoto et al.
patent: 2000-150429 (2000-05-01), None

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