Stripping with aqueous composition containing hydroxylamine and

Details Stripping with aqueous composition containing hydroxylamine and Stripping with aqueous composition containing hydroxylamine and

1993-12-02

1995-05-30

Lieberman, Paul

Cleaning and liquid contact with solids

Processes

Paints, varnishes, lacquers, or enamels, removal

134 40, 134 2, 252173, 252548, 252387, 252392, 252396, 252156, 252158, 252364, 252171, C23G 5036, C23G 114, C23G 118, B08B 308

Patent

active

054197791

ABSTRACT:
An aqueous stripping composition comprising a mixture of about 55% to 70% by weight of monoethanolamine, about 22.5 to 15% by weight of hydroxylamine and water. The stripping composition is effective to strip photoresists, residues from plasma process generated, organic, metal-organic materials, inorganic salts, oxides, hydroxides or complexes in combination with or exclusive of organic photoresist films at low temperatures without redepositing any substantial amount of metal ions.

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