Overlay targets with isolated, critical-dimension features...

Details Overlay targets with isolated, critical-dimension features... Overlay targets with isolated, critical-dimension features...

Filed on

2006-05-16

Date issued

2006-05-16

Examiner

Pham, Hoa Q. (Department: 2877)

Patent Class

Optics: measuring and testing

SubClass

Shape or surface configuration

Other Related Categories

C356S625000, C356S635000

Type

Reexamination Certificate

Status

active

Patent number

07046376

Description

ABSTRACT:
An optical metrology system is disclosed which is configured to minimize the measurement of specularly reflected light and measure primarily scattered light. The system is similar to prior art beam profile measurements but includes a movable baffle to selectively block specularly reflected light. In addition, certain non-periodic, isolated targets are disclosed suitable for evaluating overlay registration.

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