Measuring apparatus and measuring method for pattern...

Data processing: measuring – calibrating – or testing – Measurement system in a specific environment – Electrical signal parameter measurement system

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C702S117000, C714S740000

Reexamination Certificate

active

07010444

ABSTRACT:
A clock generating unit generates a clock signal having a predetermined frequency. A pattern generating unit outputs a data signal having a predetermined pattern in which one frame is configured from a predetermined bit length, so as to be synchronized with the clock signal. A waveform information acquiring unit receives the data signal as a data signal to be measured, and receives the clock signal, and acquires information of waveform in the same time domain of the data signal to be measured and the clock signal. An averaging processing unit carries out averaging processing on an acquired waveform. A phase difference detecting unit detects a phase difference of the data signal to be measured and the clock signal, for each bit, based on an averaged waveform information. A frequency band limiting processing unit carries out predetermined frequency band limiting processing on the per-bit phase difference information. A measured result outputting unit outputs the phase difference information as pattern dependent jitter.

REFERENCES:
patent: 5463639 (1995-10-01), Koishi et al.
patent: 5757652 (1998-05-01), Blazo et al.
patent: 6622107 (2003-09-01), West
patent: 2001/0012320 (2001-08-01), Watanabe et al.
patent: 5-145582 (1993-06-01), None
Agilent: “Frequency Agile Jitter Measurement System” Application Note 1267, Online!, Aug. 22, 2002, XP002275149, Retrieved from the Internet: URL:http://cp.literature.agilent.com/litweb/pdf/5988-5610EN.pdf on Mar. 25, 2004.
Agilent: “Jitter Separation—50 Mb/s to Over 40 Gb/s Using the Agilent 86100C Infiniium DCA-J” Application Note, Online!, Dec. 9, 2003, XP002275150, Retrieved from the Internet: UR::http://we/home/agilent.com/upload/cmc—upload/All/ DCAjwhitepaper 3.pdf on Mar. 25, 2004.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Measuring apparatus and measuring method for pattern... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Measuring apparatus and measuring method for pattern..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Measuring apparatus and measuring method for pattern... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3582706

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.