Method of fabricating a shiftable magnetic shift register

Details Method of fabricating a shiftable magnetic shift register Method of fabricating a shiftable magnetic shift register

2006-09-19

2006-09-19

Ahmed, Shamim (Department: 1765)

Etching a substrate: processes

Forming or treating article containing magnetically...

C216S039000, C029S603010, C029S603130, C029S603180, C360S112000, C438S003000

Reexamination Certificate

active

07108797

ABSTRACT:
A magnetic data track used in a magnetic shift register memory system may be fabricated by forming a multilayered stack of alternating dielectric and/or silicon layers. Vias of approximately 10 microns tall with a cross-section on the order of 100 nm×100 nm are etched in this multilayered stack of alternating layers. Vias may be etched form smooth or notched walls. Vias are filled by electroplating layers of alternating types of ferromagnetic or ferrimagnetic metals. The alternating ferromagnetic or ferrimagnetic layers are comprised of magnetic materials with different magnetization or magnetic exchange or magnetic anisotropies. These different magnetic characteristics allow the pinning of magnetic domain walls at the boundaries between these layers. Alternatively, vias are filled with a homogeneous ferromagnetic material. Magnetic domain walls are formed by the discontinuity in the ferromagnetic or ferromagnetic material that occurs at the notches or at the protuberances along the via walls.

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