Method of cleaning damascene structure of semiconductor...

Details Method of cleaning damascene structure of semiconductor... Method of cleaning damascene structure of semiconductor...

2006-01-31

2006-01-31

Nelms, David (Department: 2818)

Semiconductor device manufacturing: process

Chemical etching

C156S345120

Reexamination Certificate

active

06992007

ABSTRACT:
A method of cleaning a damascene structure of a semiconductor wafer comprises a process of treating the wafer, which has been polished, using pure water; and subsequently a process of treating the wafer without using pure water.

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