Illumination compensator for curved surface lithography

Photocopying – Projection printing and copying cameras – Distortion introducing or rectifying

Reexamination Certificate

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C355S047000, C355S053000

Reexamination Certificate

active

07106415

ABSTRACT:
A zero power identical pair of oppositely-oriented meniscus lens elements mounted in the projection light path, serves as curved mask support while compensating for optical anomalies such as beam shift and beam deviations produced by other transparent supports for the curved mask. The zero-power meniscus lens pair, without affecting the transmission beam characteristics, lets the beam diffract as efficiently as does a regular planar mask, thus preserving the partial coherence effects and resolution concepts of projection lithography. This simple but novel optics device is not only expected to clear several barriers for curved mask projection lithography but also find place in other applications where collimated or converging light beams have to travel extra paths without significant aberration.

REFERENCES:
patent: 4015897 (1977-04-01), Konoma et al.
patent: 5166830 (1992-11-01), Ishibai et al.
patent: 5200861 (1993-04-01), Moskovich
patent: 5757552 (1998-05-01), Murayama et al.
patent: 5917594 (1999-06-01), Norton
patent: 6416908 (2002-07-01), Klosner et al.

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